The chamber is a UHV (Ultra High Vacuum) system with a minimal pressure below 5´10-8 Torr.
It is equipped with:
2 e-beam guns,
2 thermal
sources, and
a rf
sputtering gun.
PHOTO GALLERY
|
[1] - [2] - [3] - [4] - [5] - [6] - [7] - [8] - [09] - [10] - [11] |
Here are some procedures for running a thin film evaporation, maintain and run the UHV system:
1- Maintenance
2- Use the growth wedge system
3- The rotative arm
4- Use the
multilayer fabrication system